文献类型：期刊文献

中文题名：Double设计在对称化L_2-偏差下两个下界的比较

英文题名：Comparison of Two Lower Bounds for the Symmetric L_2-discrepancy of Double Designs

作者：雷轶菊[1]

第一作者：雷轶菊

机构：[1]新乡学院数学与信息科学系

第一机构：新乡学院数学与信息科学学院

年份：2015

卷号：32

期号：3

起止页码：1-3

中文期刊名：新乡学院学报

外文期刊名：Journal of Xinxiang University

语种：中文

中文关键词：Double设计;对称化L2-偏差;下界

外文关键词：double design;symmetrized L2-discrepancy;lower bound

摘要：从列平衡的角度出发,将设计的中心化L2-偏差、对称化L2-偏差、可卷L2-偏差分别用二次型和均衡模式表示,可分别得到两个下界,它们都适合用来评价正交设计的均匀性。以double设计的对称化L2-偏差为例,证明了这两种方法算出的下界是相等的。
In view of the column balance, the centralized L2-discrepancy, symmetrized L2-discrepancy and rollable L2-discrepancy of a design could be respectively represented with quadric form and balance pattern; then two lower bounds could be respectively obtained. They were suitable for evaluating uniformity of the orthogonal designs. This paper proved in the case of the symmetric L2-discrepancy of double designs the lower bounds by two kinds of calculation methods are equal.