文献类型：期刊文献

英文题名：Colorimetric determination of uric acid based on the suppression of oxidative etching of silver nanoparticles by chloroauric acid

作者：Li, Li[1];Wang, Junli[1];Chen, Zhengbo[2]

第一作者：李丽

通讯作者：Li, L[1]

机构：[1]Xinxiang Univ, Coll Chem & Chem Engn, Xinxiang 453003, Henan, Peoples R China;[2]Capital Normal Univ, Dept Chem, Beijing 100048, Peoples R China

第一机构：新乡学院化学化工学院

通讯机构：[1]corresponding author), Xinxiang Univ, Coll Chem & Chem Engn, Xinxiang 453003, Henan, Peoples R China.|[110713]新乡学院化学化工学院;[11071]新乡学院;

年份：2020

卷号：187

期号：1

外文期刊名：MICROCHIMICA ACTA

收录：;Scopus(收录号：2-s2.0-85076049343);WOS:【SCI-EXPANDED(收录号:WOS:000510865700018)】；

基金：All authors gratefully acknowledge the financial support of Science and Technology Innovation Funds of Xinxiang University (Grant No. 15ZP05), the Natural Science Foundation of China (Grant No. 21801215) and Science Technology Open Cooperation Program of Henan Province of China (Grant No. 182106000029).

语种：英文

外文关键词：Colorimetric assay; Uric acid; Oxidation etching; Silver nanoparticles; Chloroauric acid; Redox reaction; Color change

摘要：A colorimetric method is described for the determination of uric acid (UA). The assay is based on oxidative etching of silver nanoparticles (AgNPs) by chloroauric acid (HAuCl4). The presence of UA suppresses the redox reaction between AgNPs and HAuCl4 because a competitive reaction occurs between HAuCl4 and UA. This results in a color change of the solution from brown to yellow. In parallel, the absorbance is blue shifted from 477 to 428 nm. The method has a detection limit as low as 30 pM (at S/N = 3) and a linear response range that covers the 0.1 nM to 0.1 mM UA concentration range. The reliability of the method was successfully demonstrated by analyzing spiked serum samples.