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SILICON THIN FILMS PREPARED BY PECVD USING VHF POWER IN A CIRCULAR-PARALLEL-PLATE PLASMA REACTOR  ( SCI-EXPANDED收录)  

文献类型:期刊文献

英文题名:SILICON THIN FILMS PREPARED BY PECVD USING VHF POWER IN A CIRCULAR-PARALLEL-PLATE PLASMA REACTOR

作者:Wen, Shutang[1,2];Miao, Yu[1,2];Wang, Yunhui[1];Zhang, Liwei[1];Lu, Jingxiao[1,2];Feng, Xiaoli[2];Guo, Xuejun[2];Shen, Chenhai[2];Xu, Yanhua[2];Li, Baoshun[2]

第一作者:Wen, Shutang

通讯作者:Lu, JX[1]

机构:[1]Xinxiang Univ, Sch Chem & Chem Engn, Xinxiang 453003, Peoples R China;[2]Zhengzhou Univ, Sch Phys & Engn, Zhengzhou 450052, Peoples R China

第一机构:新乡学院化学化工学院

通讯机构:[1]corresponding author), Xinxiang Univ, Sch Chem & Chem Engn, Xinxiang 453003, Peoples R China.|[110713]新乡学院化学化工学院;[11071]新乡学院;

年份:2010

卷号:24

期号:22

起止页码:4209-4216

外文期刊名:INTERNATIONAL JOURNAL OF MODERN PHYSICS B

收录:;Scopus(收录号:2-s2.0-78249281684);WOS:【SCI-EXPANDED(收录号:WOS:000284006300003)】;

基金:This work is supported by National Key Basic Research and Development Program of China (2006CB202601)

语种:英文

外文关键词:VHF; solar cell; non-uniformity; simulation

摘要:The deposition rate of mu c-Si films was investigated for four excitation frequencies 30, 40, 60, 70 and 80 MHz with other deposition parameters fixed. Deposition rate increases with the increasing of excitation frequency, while Raman crystallinity behaves more complicated. With the optimization of deposition parameters, p-i-n solar cells at an initial efficiency of 5.41% were fabricated. With the increasing of plasma excitation frequency, the non-uniformity of these thin films increases. To better understand the cause of the non-uniformity of these films, a numerical simulation was carried out. The numerical results generally followed the experimental data. It turned out that the standing waves and the evanescent wave guide modes on the electrode surface played an important role. In order to achieve highly uniform thin films, a triode-electrode was employed together with a pulsed power source. We found that with a proper choice of pulse frequency and DC voltage applied to the mesh, non-uniformity is less than 8% for films deposited on 10 x 10 cm(2) substrates. Simulations were also applied to analyze the results.

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